Theoretical analysis of boosting electromagnetic absorbance with mesh line metamaterial absorbers on silicon in the visible spectrum

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Hadi Teguh Yudistira, Ayodya Pradhipta Tenggara, Suratun Nafisah, Marlia Morsin

2025 Materials Science and Engineering: B Vol. 318 Article Cited by 1 Quartile

Abstract

Metamaterial absorbers have garnered significant attention due to their wide range of applications. A mesh-line metamaterial, in particular, can function effectively as an electromagnetic absorber. This absorber type is integrated with a silicon layer, with the width of the mesh lines varying between 10 nm and 40 nm. Among these, the 20 nm mesh-line metamaterial achieves the highest absorbance. By tailoring the impedance and refractive index properties, the mesh-line metamaterial minimizes both reflectance and transmittance, resulting in high absorbance. For comparison, the absorbance of bare silicon is approximately 0.09 at 0.77 PHz, whereas silicon with a 20 nm mesh-line metamaterial exhibits a significantly enhanced absorbance of 0.56 at 0.66 PHz. © 2025 Elsevier B.V.

Affiliations

Mechanical Engineering Department, Institut Teknologi Sumatera (ITERA), South Lampung, Lampung, Indonesia; Faculty of Industrial Technology, Institut Teknologi Sumatera (ITERA), South Lampung, Lampung, Indonesia; Center for Green and Sustainable Materials, Institut Teknologi Sumatera (ITERA), South Lampung, Lampung, Indonesia; Faculty of Engineering, Universitas Gadjah Mada (UGM), Yogyakarta, Indonesia; Electrical Engineering Department, Institut Teknologi Sumatera (ITERA), South Lampung, Lampung, Indonesia; Faculty of Electrical and Electronic Engineering, Universiti Tun Hussein Onn Malaysia, Johor, Malaysia; Microelectronic and Nanotechnology – Shamsuddin Research Centre, Universiti Tun Hussein Onn Malaysia, Johor, Malaysia