R.P. Khidmat, H. Fukuda, Kustiani, A.P. Wibowo
Architecture has a strong relationship with the daylight universe. It implicates further occupants' behaviour toward visual comforts, healthiness, and energy consumption. The daylight simulation in the early phase of design benefits the architect in predicting the possibilities of daylight-related target goals during the design process. A shading system is one of the strategies in approaching passive design to prevent an excessive amount of undesirable daylight intensity. This paper investigates different sun louvers shading patterns and their relation to the Useful Daylight Illuminance (UDI) in the context of Indonesia, presented by incorporating the EPW file of Jakarta. Parametric and multi-objective optimization has been used to optimize, explore, and map the design possibilities based on the louver shading component as dynamic parameters. Rhinoceros and Grasshopper, as parametric-based modelling software, were used as the primary modelling platform, while the Honeybee and Ladybug plugin were used to undergo the daylight-related environmental analysis. The design exploration iterates 2.160 design solutions with a value of dynamic parameters and the targeted UDI value embedded in each. The results show that the solution founded from iteration process has more areas of illuminance within 300 lx to 500 lx by about 15%. © Published under licence by IOP Publishing Ltd.
Graduate School of Environmental Engineering, University of Kitakyushu, Japan; Architecture Study Program, Institut Teknologi Sumatera, Indonesia; Department of Architecture, Faculty of Environmental Engineering, University of Kitakyushu, Japan; Department of Architecture, Universitas Bandar Lampung, Indonesia; Department of Architecture, Universitas Atma Jaya Yogyakarta, Indonesia
Research at a Glance
Register to unlock
Topics & SDG Alignment
Register to unlock
Collaboration
Register to unlock
Author Profile (Selected)
Register to unlock
References Overview
Register to unlock
Journal & Source
Register to unlock
Metadata & Integrity
Register to unlock